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等離子刻蝕機的工作原理和注意事項Working principle and precautions of plasma etcher

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等離子刻蝕機的工作原理和注意事項Working principle and precautions of plasma etcher

發布日期:2018-01-02 作者: 點擊:

工作原理 平麵刻蝕是在兩塊平麵電極之間進行刻蝕,它與常見的感應耦合等離子體(ICP)不同,是通過高壓線圈產生的。91xjcc下载ioses的SCE係列鋁製反應艙等離子體係統是該領域Z新的產品。

等離子刻蝕機的注意事項 

#.在設備工作時,禁止扶、靠設備,禁止觸摸高頻電纜和線圈,以免發生意外

#.高頻電源實際使用功率不能超過Z大限製#.檢查設備時,必須關機後切斷電源 

#. 工作場地必須保持清潔、幹燥,設備上及設備周圍不得放置無關物品,特別是易燃、易爆物品 

#.長期停放時注意防潮,拆除電源進線,每隔3-5天開一次機,保證反應室真空以免被汙 染 

#.設備停機、過夜也要保持反應室真空,如停機較長時間後再進行刻蝕工藝,需先進行一次空載刻蝕,再刻蝕矽片

       Working principle plane etching is performed between two plane electrodes, which is different from the common inductively coupled plasma (ICP), and is produced by high-voltage coil. Our SCE series aluminum reaction chamber plasma system is the latest product in this field. 

       Precautions for plasma etching machine, 

       #.Do not hold or lean on the equipment, and do not touch the high-frequency cable and coil to avoid accidents. 

       #. The actual power of high-frequency power supply cannot exceed the maximum limit.# When checking the equipment, the power supply must be cut off after shutdown. 

       #. The working site must be kept clean and dry. No irrelevant items, especially inflammable and explosive items, shall be placed on and around the equipment. 

       #. When parking for a long time, pay attention to moisture-proof, remove the power incoming line, and open the machine every 3-5 days to ensure that the vacuum in the reaction room is not polluted.

       #. When the equipment is shut down or overnight, the vacuum in the reaction chamber shall be maintained. If the equipment is shut down for a long time, then the etching process shall be carried out. In addition, one no-load etching shall be carried out first, and then the silicon wafer shall be etched

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相關標簽:等離子刻蝕機

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