Name: Suzhou cycas Microelectronics Co., Ltd.
Address: 1st floor,B06 building,No.2,Fuxing Road,Zhangjiagang Economic Development Zone,Jiangsu Province 215600PRC
The working principle of magnetron sputtering is that electrons collide with argon atoms in the process of flying to the substrate under the action of electric field E, resulting in AR positive ions and new electrons; new electrons fly to the substrate, and Ar+ ions accelerate to the cathode target under the action of electric field, and bombard the target surface with high energy, resulting in sputtering of the target. In sputtered particles, the neutral target atoms or molecules are deposited on the substrate to form a thin film, and the secondary electrons generated will be affected by the electric field and magnetic field, resulting in the direction drift of E (electric field) × B (magnetic field), which is called e × B drift for short, and its motion track is similar to a cycloid.
If the magnetic field is circular, the electrons move in the form of approximate cycloid on the target surface. Their motion path is not only very long, but also bound in the plasma region near the target surface. In this region, a lot of AR is ionized to bombard the target, thus achieving a high deposition rate. With the increase of the number of collisions, the energy of the secondary electrons is exhausted and gradually away from the target surface, and finally deposited on the substrate under the action of the electric field E. Because the energy of the electron is very low and the energy transferred to the substrate is very small, the substrate temperature rise is low.
Magnetron sputtering is a collision process between the incident particles and the target. The incident particle experiences a complex scattering process in the target, collides with the target atom, and transfers part of the momentum to the target atom, which collides with other target atoms, forming a cascade process. In this kind of cascade process, some target atoms near the surface obtain enough momentum to move outwards, leaving the target to be sputtered out.