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磁控濺射台設備用途和功能特點Application and function of magnetron sputtering equipment

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磁控濺射台設備用途和功能特點Application and function of magnetron sputtering equipment

發布日期:2018-01-03 作者:www.tonertimes.com 點擊:

磁控濺射台設備用途和功能特點 

   1、該設備是一種多功能磁控濺射鍍膜設備,適用於鍍製各種單層膜、多層膜及攙雜膜係。可鍍金屬、合金、化合物、半導體、陶瓷膜(需配射頻電源)、介質複合膜和其它化學反應膜。


  2、為避免微粒物資落到基片上,采用基片在上、磁控濺射靶在下的結構,即由下向上濺射。3、為滿足鍍製攙雜膜的要求,采用多靶向心濺射的方式。


  4、可以采用單靶獨立、雙靶、三靶任意輪流或組合共濺工作模式,射頻直流兼容。


  5、所有靶麵均可以沿軸向位移,與真空室軸夾角70o,位移量±50mm,可變角度±15o。所有靶上都帶有電動檔板,以防止靶麵在未工作時被汙染。這一功能為尋找實驗參數提供了強有力的實驗手段。


  6、為了保證鍍膜的工藝性(預濺射、多層膜、攙雜膜、防止交叉汙染和幹擾等),每隻磁控濺射靶均配備磁力耦合電動擋板(配裝電機),可在操作麵板上電動控製靶擋板的開關。

磁控濺射台

  7、基片加熱器采用高純石墨加熱器,可以避免加熱元件放氣或揮發對基片和真空室的汙染,加熱器的可靠性高,壽命長。


  8、由於采用了超高真空密封技術,極限真空度高,可達2×10-5Pa,可保證更高的鍍膜純淨度,提高鍍膜質量。


  恢複工作真空時間短,從大氣到工作真空(7×10-4Pa)時間30~40分鍾(充幹燥氮氣)


  運動部件的密封,采用磁力耦合動密封技術。


  真空規用金屬規(不用玻璃規),密封口用刀口金屬密封結構。

  1. This equipment is a multi-functional magnetron sputtering coating equipment, suitable for plating various single-layer film, multilayer film and mixed film system. It can be plated with metals, alloys, compounds, semiconductors, ceramic films (with RF power supply), composite films and other chemical reaction films. 

  2. In order to avoid the particle materials falling on the substrate, the structure of substrate on top and magnetron sputtering target on the bottom is adopted, that is, sputtering from the bottom up.

  3. In order to meet the requirements of the mixed films, multi-target centripetal sputtering was used.

  4. It can use single target independent, double target, three target random rotation or combination of common splash mode, RF DC compatible.

   5. All target surfaces can be displaced along the axial direction, with an angle of 70O, a displacement of ± 50mm and a variable angle of ± 15O. All targets are equipped with electric baffles to prevent the target surface from being polluted when it is not working. This function provides a powerful experimental means for finding experimental parameters. 

   6. Each magnetron sputtering target is equipped with a magnetic coupling electric baffle (equipped with a motor) to ensure the coating process (pre sputtering, multi-layer film, mixed film, prevention of cross contamination and interference, etc.), and the switch of the baffle can be electrically controlled on the operation panel. 

   7. The substrate heater adopts high-purity graphite heater, which can avoid the pollution of substrate and vacuum chamber caused by the outgassing or volatilization of heating elements. The heater has high reliability and long service life.

   8. Due to the use of ultra-high vacuum sealing technology, the ultimate vacuum degree is high, up to 2 × 10-5pa, which can ensure a higher purity of the coating and improve the quality of the coating. 

     The time from atmosphere to working vacuum (7 × 10-4Pa) is 30-40 minutes (filled with dry nitrogen). 

     The magnetic coupling dynamic sealing technology is adopted. The vacuum gauge uses a metal gauge (no glass gauge), and the sealing edge uses a knife edge metal sealing structure.

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