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聯係91guochan

名 稱:蘇州91guochan電子科技有限公司

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Name: Suzhou cycas  Microelectronics Co., Ltd.

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91xjcc下载ioses電子帶您了解高真空磁控濺射台Cycas electronics show you the high vacuum magnetron sputtering table

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91guochan電子帶您了解高真空磁控濺射台Cycas electronics show you the high vacuum magnetron sputtering table

發布日期:2018-01-03 作者:www.tonertimes.com 點擊:

91guochan電子帶您了解高真空磁控濺射台

1. 設備基本構造形式:該設備係是渦輪分子泵+機械泵抽氣的單室高真空全不鏽鋼係統。主真空室下底盤上安裝ф50三支磁控靶。真空室上蓋上安裝樣品轉盤,樣品轉盤由水冷和加熱爐兩套組成,二者不能同時兼用,隻能交替使用(係統需要暴露空氣,更換轉盤)。水冷轉盤下方可放置六片ф40樣品,每片樣品均可在計算機控製下製備多層膜,鍍完膜的樣品可手動公轉換位。加熱轉盤隻攜掛一片樣品, 做周向±180°轉動。在計算機控製下製備多層膜。除大法蘭密封口、轉盤轉動密封及磁控除大法蘭蓋和磁控靶靶頭采用氟膠圈密封外,其餘均按超高真空要求設計,采用無氧銅圈金屬密封。

磁控濺射台

2. 真空係統采用FB600渦輪分子泵+2XZ-8機械泵抽氣;真空室經24小時連續烘烤後,其極限真空≤6.6 10-5pa;係統從大氣開始抽氣,在≤30分鍾內,其真空度≤6.6 10-4pa;停泵關機12小時後,係統真空度≤5pa,其真空度采用DL-9複合真空計測量。

3. Ф50、水冷、RF和DC兼容磁控靶三支,均有各自的電動擋板。

4. 樣品尺寸Ф40、分水冷和加熱爐轉盤、二者更換交替使用。在樣品下加裝擋板。樣品加熱溫度400±1°(加熱爐做周向±80°回轉)。

5. 電源采用RF射頻電源N=500W f=13.5MHZ一台;DC直流穩流電源N=500W 1A 500V 兩台。

6. 進氣係統采用兩路MFC質量流量計控製。另一路用手動進氣閥直接進氣。

7. 實驗過程中係統的複位功能、確認靶位功能、濺射鍍膜時間控製功能、回轉控製功能均由計算機控製。

           Cycas electronics takes you to know about the high vacuum magnetron sputtering Table 

  1.     Basic structure of the equipment: the equipment is a single chamber high vacuum all stainless steel system pumped by turbomolecular pump + mechanical pump. Three ф 50 magnetic control targets are installed on the chassis under the main vacuum chamber. A sample turntable is installed on the upper cover of the vacuum chamber. The sample turntable is composed of two sets of water-cooling and heating furnace, which can not be used at the same time and can only be used alternately (the system needs to expose air and replace the turntable). Six ф 40 samples can be placed under the water-cooled turntable. Each sample can be prepared under the control of a computer. The coated sample can be rotated manually. Only one sample is carried by the heating rotary table and rotated in a circumferential direction of ± 180 °. Multilayers were prepared under the control of computer. Except for the large flange seal port, rotary seal of rotary table and magnetic control, except that the large flange cover and magnetic control target head are sealed with fluorine rubber ring, the rest are designed according to the requirements of ultra-high vacuum and sealed with oxygen free copper ring metal.

  2.     The vacuum system adopts fb600 turbomolecular pump + 2xz-8 mechanical pump to pump air; after the vacuum chamber is baked continuously for 24 hours, its limit vacuum is ≤ 6.610-5pa; the system starts to pump air from the atmosphere, and its vacuum degree is ≤ 6.610-4pa within ≤ 30 minutes; after the pump is stopped and shut down for 12 hours, the system vacuum degree is ≤ 5pa, and its vacuum degree is measured by dl-9 composite vacuum meter.

  3.    Three Ф 50, water-cooled, RF and DC compatible magnetron targets, each with its own electric baffles.

  4.    The sample size is Ф 40, the water cooling and heating furnace turntable are replaced and used alternately. Install baffle under the sample. The heating temperature of the sample is 400 ± 1 ° (the heating furnace rotates in a circumferential direction of ± 80 °).

  5.    One RF power supply n = 500W f = 13.5mhz and two DC current stabilized power supplies n = 500W 1A 500V are adopted.

  6.    The air intake system is controlled by two MFC mass flow meters. The other way uses the manual intake valve to directly intake air.

  7.    During the experiment, the reset function, target position confirmation function, sputtering coating time control function and rotation control function of the system are all controlled by the computer.


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