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Magnetron sputtering (磁控濺射台))

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什麽是全自動型磁控濺射台?What is a fully automatic magnetron sputtering table?

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什麽是全自動型磁控濺射台?What is a fully automatic magnetron sputtering table?

發布日期:2018-04-08 作者:www.tonertimes.com 點擊:

什麽是全自動型磁控濺射台?

磁控濺射是為了在低氣壓下進行高速濺射,必須有效地提高氣體的離化率。通過在靶陰極表麵引入磁場,利用磁場對帶電粒子的約束來提高等離子體密度以增加濺射率的方法, 全自動型磁控濺射台,通過對真空係統,下遊壓力閉環控製,射頻電源,氣體流量及工藝過程的全自動控製,以及所安全互鎖,智能監控,在線狀態記憶,斷電保護等.現在很多國產廠家都能做到這些功能

技術分類

可以分為直流磁控濺射法和射頻磁控濺射法。

磁控濺射台

特點介紹

全自動磁控濺射台采用PLC控製,觸摸顯示屏操作,其數字號參數界麵和自動化操作方式為用戶提供優良的研發和生產平台.

主要用途

     全自動磁控濺射台可在矽片、塑料、陶瓷、玻璃、石英、Ⅲ-Ⅴ族化合物及金屬等材料表麵鍍製AI、Au、Cr、Ti、Ni、Cu、W、SiO2、各種金屬、非金屬,單層、多層膜。它具有均勻性好、濺射速率高、基片升溫低、靶材節省等特點。

使用範圍

本設備主要用於微電子、光電子、通訊、微機械等領域的器件研發和製造。

What is a fully automatic magnetron sputtering table? 

    Magnetron sputtering is for high-speed sputtering at low pressure, so it is necessary to effectively improve the gas ionization rate. By introducing a magnetic field on the cathode surface of the target and using the restriction of the magnetic field on the charged particles to improve the plasma density and increase the sputtering rate, the full-automatic magnetron sputtering table can control the vacuum system, downstream pressure closed-loop control, RF power supply, gas flow and process automatically, as well as the safety interlock, intelligent monitoring and online state memory, Now many domestic manufacturers can do these functional technology 

   Classification can be divided into DC magnetron sputtering and RF magnetron sputtering. 

   Features: the automatic magnetron sputtering table is controlled by PLC and operated by touch screen, Its digital parameter interface and automatic operation mode provide users with an excellent R & D and production platform. 

   Its main purpose is to prepare AI, Au, Cr, Ti, Ni, Cu, W, SiO2, various metals, nonmetals, single-layer and multi-layer films on the surface of silicon, plastic, ceramics, glass, quartz, Ⅲ - Ⅴ group compounds and metals. It has the advantages of good uniformity, high splash rate, low substrate temperature rise and target saving. 

  Scope of application: This equipment is mainly used in the research, development and manufacturing of devices in the fields of microelectronics, optoelectronics, communication, micro machinery, etc.

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相關標簽:磁控濺射台

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