Name: Suzhou cycas Microelectronics Co., Ltd.
Address: 1st floor,B06 building,No.2,Fuxing Road,Zhangjiagang Economic Development Zone,Jiangsu Province 215600PRC
In the intermediate frequency reactive sputtering, when the applied voltage on the target is in the negative half cycle, the target surface is sputtered by positive ions; in the positive half cycle, the electrons in the plasma are accelerated to the target surface, neutralizing the positive charge accumulated on the target surface, thus inhibiting the ignition. However, at a certain working field strength, the higher the frequency, the shorter the acceleration time of the positive ions in the plasma, the less the energy absorbed by the positive electric field from the external electric field, the lower the energy of the positive ions bombarding the target, and the lower the sputtering rate of the target. Because the frequency range of sputtering voltage is in the range of 10-80khz, it is also called if sputtering .
Magnetron sputtering table
The medium frequency sputtering of magnetron sputtering platform is often used to sputter two targets, usually two targets side by side, with the same size and shape. Therefore, these two targets are often called twin targets. The twin targets are suspended in the sputtering chamber. In the sputtering process, the two targets are alternately used as cathodes and anodes, which not only suppress the ignition, but also eliminate the disappearance of anodes in the DC reactive magnetron sputtering, so that the sputtering process can be carried out stably.