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Magnetron sputtering (磁控濺射台))

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What is intermediate frequency magnetron sputtering?

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What is intermediate frequency magnetron sputtering?

發布日期:2018-02-01 作者: 點擊:

     在中頻反應濺射中,當靶上所加的電壓處於負半周時,靶麵被正離子濺射;而在正半周時,等離子體中的電子被加速到靶麵,中和了靶麵上積累的正電荷,從而抑製了打火。但在確定的工作場強下,頻率越高,等離子體中正離子被加速的時間越短,正電場從外電場吸收的能量越少,轟擊靶的正離子能量越低,靶的濺射速率也降低。由於濺射電壓的頻率範圍處於10~80KHz範圍,因此又叫中頻濺射']

磁控濺射台

     磁控濺射台中頻濺射常用於濺射兩個靶,通常為並排的兩個靶,尺寸和外形全部相同,因此這兩個靶常稱為孿生靶。孿生靶在濺射室中懸浮安裝,在濺射過程中,兩個靶周期性輪流作為陰極與陽極,既抑製了打火,而且由於消除了普通直流反應磁控濺射中的陽極消失現象,從而使濺射過程得以穩定進行。 

   In the intermediate frequency reactive sputtering, when the applied voltage on the target is in the negative half cycle, the target surface is sputtered by positive ions; in the positive half cycle, the electrons in the plasma are accelerated to the target surface, neutralizing the positive charge accumulated on the target surface, thus inhibiting the ignition. However, at a certain working field strength, the higher the frequency, the shorter the acceleration time of the positive ions in the plasma, the less the energy absorbed by the positive electric field from the external electric field, the lower the energy of the positive ions bombarding the target, and the lower the sputtering rate of the target. Because the frequency range of sputtering voltage is in the range of 10-80khz, it is also called if sputtering .

Magnetron sputtering table

   The medium frequency sputtering of magnetron sputtering platform is often used to sputter two targets, usually two targets side by side, with the same size and shape. Therefore, these two targets are often called twin targets. The twin targets are suspended in the sputtering chamber. In the sputtering process, the two targets are alternately used as cathodes and anodes, which not only suppress the ignition, but also eliminate the disappearance of anodes in the DC reactive magnetron sputtering, so that the sputtering process can be carried out stably.


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