語言
Magnetron sputtering (磁控濺射台))

新聞資訊

熱門關鍵詞

聯係91shipin

名 稱:蘇州91shipin電子科技有限公司

電 話:0512-58987901

傳 真:0512-58987201

郵 箱:sales@tonertimes.com

地 址:江蘇省張家港經濟開發區複興路2號B06棟1樓215600PRC

網 址:www.tonertimes.com

Name: Suzhou cycas  Microelectronics Co., Ltd.

Tel.: 0512-58987901

Fax: 0512-58987201

Email: sales@tonertimes.com

Address: 1st floor,B06 building,No.2,Fuxing Road,Zhangjiagang Economic Development Zone,Jiangsu Province 215600PRC

Website: www.tonertimes.com 

Magnetron sputtering has two characteristics of "low temperature" and "high speed"磁控濺射具有“低溫”、“高速”兩大特點Magnetron sputtering has two characteristics of

您的當前位置: 首 頁 >> 新聞資訊 >> 行業新聞

Magnetron sputtering has two characteristics of "low temperature" and "high speed"磁控濺射具有“低溫”、“高速”兩大特點Magnetron sputtering has two characteristics of

發布日期:2019-12-30 作者: 點擊:

磁控濺射具有“低溫”、“高速”兩大特點

TIM圖片20191230092844.png

   產生這兩大特點的原理為:磁控濺射是以磁場來改變電子的運動方向,並束縛和延長電子的運動軌跡,從而提高電子對工作氣體的電離幾率和有效的利用了電子的能量。因此,是正離子對靶材轟擊所引起的靶材濺射更加有效。同時受正交電磁場的束縛電子,又隻能在其能量要耗盡時才沉積在基片上。所以磁控濺射具有“低溫”“高速”這兩大特點。


                                                                    

                                  Magnetron sputtering has two characteristics of "low temperature" and "high speed"

   The principle of producing these two characteristics is: magnetron sputtering uses magnetic field to change the direction of electron motion, and to bind and extend the trajectory of electron motion, so as to improve the ionization probability of electron to working gas and effectively use the energy of electron. Therefore, sputtering caused by positive ion bombardment is more effective. At the same time, the electrons bound by the orthogonal electromagnetic field can only be deposited on the substrate when their energy is exhausted. Therefore, magnetron sputtering has two characteristics of "low temperature" and "high speed".


本文網址:http://www.tonertimes.com/news/439.html

相關標簽:磁控濺射台

Z近瀏覽: